A p-type Si click this wafer (orientation <100>) possessing a resistivity of 1 to 10�C20 ��-cm (MEMC Electronic Materials) together with a 1,000 nm thick SiO2 layer was used as the substrate. The chromium and gold wire (Kurt J. Lesker Company) were used in evaporation and magnetron Inhibitors,Modulators,Libraries sputtering technique had a purity of 99.999%. Other necessary chemicals (NH3, H2O2, HF, HCl and acetone) were supplied by Sigma Aldrich and were used without further purification. Finally, the deionized water used in the experiments was obtained from a Barnstead (Nanopure II) water deionizing system available in the laboratory.2.2. Fabrication of ChipAfter cleaning wafers according to the standard method (RCA) and drying by nitrogen gas (as shown in Figure 1(a)), the photoresist AZl512 was deposited using spin coating and UV-lithography through the designed mask (as shown in Figure 1(b)).
After this process, chromium and then gold deposition on silicon substrate of 90 and 150 nm respectively was achieved by DC magnetron Inhibitors,Modulators,Libraries sputtering and thermal evaporation (as in Figure 1(c,d)). A lift-off process is followed as the very final part of an experiment (see Figure 1(e)).Figure 1.Schematic diagram showing the sample preparation. (a) The sample preparation. (RCA); (b) The photoresist deposition and UV-exposure through the mask; (c) Chorumum deposition; (d) Gold deposition; (e) Lift off process.2.3. MeasurementsDNA solution was first diluted to a suitable concentration of 0.01 mg/mL and allowed to flow along Inhibitors,Modulators,Libraries the gap between gold electrodes using a micro-syringe.
Once a 70�C100 ��L drop of the DNA solution is deposited in the gap under influence of an external 200 kHz electric field (a 12 volt AC supply) for few second, the probability of DNA-gold contact rises. Then, a 12 volt DC supply is connected to the electrodes that align DNA strands parallel to the electric field.I�CV characterization of MDM in the presence Inhibitors,Modulators,Libraries and absence of magnetic field, generated by an Electromagnet 3472-50, in dark conditions (inside a cryostat with light protection) was achieved using a semiconductor analyzer (SMU-236, Keithly) at different temperatures using a temperature controller Lakeshore-331 (as depicted in Figure 2).Figure 2.Two electrodes L and R (L = left, R = right) with an insulator gap in the gold-DNA-gold structure in the presence of external magnetic field is placed inside cryostat connected to temperature controller, semiconductor analyzer.
(a) MDM; (b) Electromagnet; …3.?Results and DiscussionFigure 2 illustrates the setup for measuring the gold-DNA-gold in the presence of a perpendicular magnetic field. The sample was placed in Dacomitinib a cryostat under the magnetic field that generated by electromagnet while connected to a semiconductor analyzer, and a temperature controller.The I�CV characteristic selleck inhibitor curve for gold-DNA-gold structure in the presence of various magnetic fields was measured in this setup (Figure 3).